Response to Comment on 'High quality YBa2Cu3O7 Josephson junctions made by direct electron beam writing'

Response to “Comment on ‘High quality YBa2Cu307 Josephson junctions made by direct electron beam writing’ ” [Appl. Phys. Let-t. 64, 3190 (i9Wl S. K. Tolpygo, S. Shokhor, B. Nadgorny, J.-Y. Lin, and M. Gurvitch Department of Physics, State University of New Ydrk at Stony Brook, Stony Brook, New York 11794-3800 A. Bourdillon Deuartment of Materials Science and Enaineerina, State Universify of New York at Stony Brook, St&y Brook, New York 11794-2275 - S. Y. Hou and Julia M. Phillips AT&T Bell Laboratories, Murray Hill, New Jersey 07974 (Received 2 December 1993) In response to Tinchevr we would like to acknowledge eters used in e-beam writing as well as definitive results, that the idea of using a focused electron beam in a scanning leaving little doubt that the weak links obtained by this tech- electron microscope to damage a narrow region across a nique are indeed Josephson junctions. We would like to take high-T, thin film bridge was indeed expressed in his 1990 this opportunity to reference one more article, omitted in our article.’ However, contrary to Tinchev’s claim that “the first letter, reported by us at a conference in 1991 and published successfully fabricated junctions by this technique were de- in 1992, it included our preliminary bridge modification data scribed in that publication,” no such data or any other data and Monte Carlo simulation of electron trajectories for dif- on e-beam irradiated samples were presented there at all. ferent ...