Templated fabrication of periodic nanostructures based on laser interference lithography [Elektronische Ressource] / von Ran Ji

TEMPLATED FABRICATION OF PERIODIC NANOSTRUCTURES BASED ON LASER INTERFERENCE LITHOGRAPHY Dissertation zur Erlangung des akademischen Grades Doktoringenieur (Dr.-Ing.) genehmigt durch das Zentrum für Ingenieurwissenschaften der Martin-Luther-Universität Halle-Wittenberg von Herrn M. Sc. Ran Ji geboren am 06.12.1977 in Liaoning, China Gutachter: 1. Prof. Dr. Ulrich Gösele 2. Prof. Dr. Ulrich Kunze Halle (Saale), den 10.01.2008 Verteidigt am 12.06.2008 urn:nbn:de:gbv:3-000013939[http://nbn-resolving.de/urn/resolver.pl?urn=nbn%3Ade%3Agbv%3A3-000013939]ABSTRACT The fundamentals laser interference lithography (LIL) and the experimental setup -Lloyd’s-Mirror Interferometer- are described, which allows the parallel fabrication of periodic nanostructures, such as grating and hole/dot arrays, with a period ranging from 170 nm to 1.5 μm on 4-inch wafer areas. The following novel nanostructured applications have been developed: (1) Combined with electrodeposition or atomic layer deposition techniques, large-scale nanowire and nanoring arrays have been fabricated. (2) Wafer-scale Si N and Ni imprint stamps with periodic imprint structures have been 3 4replicated from master structures generated by LIL.