Radiation stability of EUV multilayer mirrors [Elektronische Ressource] / von Nicolas Benoit

Radiation Stability of EUV Multilayer MirrorsDissertationzur Erlangung des akademischen Gradesdoctor rerum naturalium (Dr. rer. nat.)vorgelegt dem Rat derPhysikalisch-Astronomischen Fakultätder Friedrich-Schiller-Universität JenavonDipl.-Phys. Nicolas Benoitgeboren am 21. Januar 1979 in ParisGutachter1. Prof. Dr. rer. nat. habil. Andreas Tünnermann, Friedrich-Schiller-Universität Jena2. Prof. Dr. rer. nat. habil. Eckhart Förster, Friedrich-Schiller-Universität Jena3. Prof. Dr. rer. nat. habil. Ute Kaiser, Universität UlmTag der letzten Rigorosumsprüfung: 12.06.2007Tag der öffentlichen Verteidigung: 28.06.2007AbstractThisthesisdescribesthedevelopmentandcharacterizationofhighthermalandradiationstableSi-basedmultilayermirrorsfortheirapplicationinextremeultravioletlithographicsteppers. Although EUV Lithography (EUVL) is an optical lithography, the reducedwavelength introduces new challenges because all materials are absorbing at 13.5 nm:The application of multilayer mirrors in EUVL requires not only the highest possiblenormal-incidence reflectivity but also a long-term thermal and radiation stability at op-erating temperatures. This requirement is most important in the case of the collectormirror of the illumination system close to the EUV source where a short-time decreasein reflectivity is most likely.