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138
pages
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English
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Documents
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2008
Description
Nanocrystalline Diamond Growth and Device Applications DISSERTATION zur Erlangung des akademischen Grades eines DOKTOR-INGENIEURS (DR.-ING.) der Fakultät für Ingenieurwissenschaften und Informatik der Universität Ulm von Michele Dipalo AUS TORINO Betreuer: Prof. Dr.-Ing. Erhard Kohn Amtierender Dekan: Prof. Dr.-Ing. Michael Weber Ulm, 02.10.2008 Contents List of symbols List of figures Summary 1. Introduction 1 1. Introduction 1 2. Structure and properties of diamond 4 3. Structure and properties of poly-crystalline (PCD) and nano-crystalline (NCD) diamond 6 2. CVD diamond 9 1. CVD diamond growth 10 1. Substrates for CVD diamond growth 12 2. Diamond nucleation 14 2. Plasma CVD 16 3. Hot Filament CVD 17 4. CVD diamond doping 20 1. P-type Doping 21 2. N-type Doping 23 3. Grain boundaries Doping 24 3. Nano-crystalline Diamond (NCD): Growth and characterization 25 1. Intrinsic NCD growth: the role of methane concentration 28 2. Boron doped NCD: the role of grain size on electrical properties 32 3. Boron doped NCD: the role of grain size on electrochemical properties 34 4. Intrinsic NCD cap layer on boron doped NCD 37 5. Boron delta doping of NCD in Hot Filament CVD 41 1. Growth of boron delta doped NCD 42 2. Electrochemical characterization 44 6. Nanodiamond growth on InAlN/GaN in Hot Filament and Plasma CVD 47 1. Diamond nucleation and growth 48 2.
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Publié par
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Publié le
01 janvier 2008
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Langue
English
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Poids de l'ouvrage
2 Mo