Metal organic chemical vapor deposition of indium oxide for ozone sensing [Elektronische Ressource] / von Chunyu Wang

Metal organic chemical vapor deposition of indium oxide for ozone sensing Der Fakultät für Angewandete Wissenschaft der Albert-Ludwigs-Universität Freiburg i. Br. zur Erlangung des akademischen Grades eines Doktor-Ingenieurs vorgelegt und genehmigte Dissertation von Chunyu Wang Dekan: Prof. Dr. Hans Zappe Referent: Prof. Dr. Oliver Ambacher Korreferent: Prof. Dr. Gerald Urban Tag der mündlichen Prüfung: February 06, 2009 1Abstract In this work, a novel type of ozone sensor based on the photoreduction and oxidation principles operating at room temperature was developed. First, MOCVD techniques were used to grow high-quality Indium oxide thin films and nanostructures, to be used as ozone sensing materials. On sapphire substrates, highly textured bcc-In O films were grown using a low-temperature indium oxide film 2 3as the buffer layer. Furthermore, for the first time, meta-stable rh-In O films were 2 3epitaxially grown on sapphire substrate by means of MOCVD, which usually can only be obtained under high-temperature and high-pressure conditions. In O nanoparticles 2 3were also obtained at low substrate temperatures using TMIn and water vapour as the precursors, leading to a low-cost fabricating process. In addition, In O thin films were 2 3successfully deposited on III-N (GaN, AlN, and InN) substrates.