Detailed investigations of the sheath dynamics and elementary processes in capacitively coupled RF plasmas [Elektronische Ressource] / vorgelegt von: Kristian Dittmann

ERNST-MORITZ-ARNDT-UNIVERSITATGREIFSWALDDetailed Investigations of the Sheath Dynamics andElementary Processes in Capacitively Coupled RF PlasmasI n a u g u r a l d i s s e r t a t i o nzurErlangung des akademischen Gradesdoctor rerum naturalium (Dr. rer. nat.)an der Mathematisch-Naturwissenschaftlichen Fakult atderErnst-Moritz-Arndt-Universit at Greifswaldvorgelegt von: Kristian Dittmanngeboren am 18. September 1980in PrenzlauGreifswald, 25. Juni 2009Dekan: Prof. Dr. K. Fesser1. Gutachter: Prof. Dr. J. Meichsner2. Gutachter: Prof. Dr. W. GrahamTag des Promotionskolloquiums: 12. Oktober 2009"Let us now assume that the plane electrode be charged to a negativepotential of 100 volts. Electrons will therefore be prevent fromapproaching close to the electrode, whereas positive ions will be drawntowards it. There will therefore be a layer of gas near the electrodewhere there are positive ions but no electrons, and in this region therewill therefore be a positive ion space charge. The outer edge of thissheath of ions will have a potential of -1 and the positive ions passthrough this outer edge with a velocity corresponding to 2 volts."Langmuir (1923) [1]"Except near the electrodes, where there are sheaths containing veryfew electrons, the ionized gas contains ions and electrons in about equalnumbers so that the resultant space charge is very small.